Freeware Layout Editor
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| − | This program is best operated from the CVL workstations rather than remote access unless you wish to test your patience. Alternately, you could download the | + | *This program is best operated from the CVL workstations rather than remote access unless you wish to test your patience. Alternately, you could download the last freeware version directly from the blog listed: |
| − | + | :::'''Mirror:''' | |
| − | + | :::[http://www.guyslikedolls.com/mirroring-layouteditor Freeware LayoutEditor] | |
| − | + | *This software is no longer available for free from the developer. A link to their website is in order | |
| − | This customized version has an extra feature | + | :::'''Official Website:''' |
| − | + | :::[http://www.layouteditor.net Official LayoutEditor] | |
| − | + | ---- | |
| − | + | ||
| − | + | 1. To launch the program, login to CVL and execute the command: | |
| − | + | ||
| − | + | :::'''[login@cvlxx ~]layout-mems &''' | |
| − | + | ||
| − | + | :*This customized version has an extra feature the download from the website does not have. It has a "3D Add-on" for viewing 3D models of some simple structures which are based on a predefined 4-layer process, described in order below: | |
| − | + | ||
| − | + | ::'''Substrate Etch''' - Layer 4 - Positive PR and Dark Field & etch | |
| − | + | ::'''Oxide Etch''' - Layer 9 - Positive PR and Dark Field & etch | |
| − | + | ::'''PolySilicon Deposition''' - layer 14 - Positive PR and Clear Field & etch | |
| + | ::'''Metal deposit''' - Layer 19 - Positive PR and Dark Field & Liftoff | ||
| + | |||
| + | 2. If your layout conforms to this process, you can view the 3D model as follows: | ||
| + | |||
| + | ---- | ||
| + | :1. Go to "Utilities->Macros" and select "MEMS Technology". | ||
| + | ::'''Note:''' This prepares the layers for further process simulation. | ||
| + | |||
| + | :2. To verify check the names of the layers. | ||
| + | ::'''Note:''' Obviously, your features should be in the layers as numbered above. | ||
| + | |||
| + | :3. In the Topcell go to "Utilities->Macros" and select "3D View Normalizer_v1". | ||
| + | ::'''Note:''' A new cell should be created with the name "3D_Trans". | ||
| + | |||
| + | :4. Go to "Utilities->3D Addon" and select "Render Addon" | ||
| + | ::'''Note:''' The 3D View should now be displayed in a separate window. | ||
| + | ---- | ||
To be updated further.... | To be updated further.... | ||
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Latest revision as of 22:20, 16 December 2013
- This program is best operated from the CVL workstations rather than remote access unless you wish to test your patience. Alternately, you could download the last freeware version directly from the blog listed:
- Mirror:
- Freeware LayoutEditor
- This software is no longer available for free from the developer. A link to their website is in order
- Official Website:
- Official LayoutEditor
1. To launch the program, login to CVL and execute the command:
- [login@cvlxx ~]layout-mems &
- This customized version has an extra feature the download from the website does not have. It has a "3D Add-on" for viewing 3D models of some simple structures which are based on a predefined 4-layer process, described in order below:
- Substrate Etch - Layer 4 - Positive PR and Dark Field & etch
- Oxide Etch - Layer 9 - Positive PR and Dark Field & etch
- PolySilicon Deposition - layer 14 - Positive PR and Clear Field & etch
- Metal deposit - Layer 19 - Positive PR and Dark Field & Liftoff
2. If your layout conforms to this process, you can view the 3D model as follows:
- 1. Go to "Utilities->Macros" and select "MEMS Technology".
- Note: This prepares the layers for further process simulation.
- 2. To verify check the names of the layers.
- Note: Obviously, your features should be in the layers as numbered above.
- 3. In the Topcell go to "Utilities->Macros" and select "3D View Normalizer_v1".
- Note: A new cell should be created with the name "3D_Trans".
- 4. Go to "Utilities->3D Addon" and select "Render Addon"
- Note: The 3D View should now be displayed in a separate window.
To be updated further....
